Axel Klauck: search on Z-Library

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1

FARP2, HDLBP and PASK are downregulated in a patient with autism and 2q37.3 deletion syndrome

Bärbel Felder, Bernhard Radlwimmer, Axel Benner, Antoaneta Mincheva, Grischa Tödt, Kim S. Beyer, Claudia Schuster, Sven Bölte, Gabriele Schmötzer, Sabine M. Klauck, Fritz Poustka, Peter Lichter, Annem

Journal:

American Journal of Medical Genetics Part A

Year:

2009

Language:

english

File:

PDF, 181 KB

english, 2009

2

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Application of photodecomposable base concept to 193-nm resists

Padmanaban, Munirathna, Bae, Jun-Bom, Cook, Michelle M., Kim, Woo-Kyu, Klauck-Jacobs, Axel, Kudo, Takanori, Rahman, M. D., Dammel, Ralph R., Byers, Jeff D., Houlihan, Francis M.

Year:

2000

Language:

english

File:

PDF, 3.58 MB

english, 2000

3

Sensitized Transparent Photobase Additive For 193 nm Lithography.

Padmanaban, Munirathna, Bae, Jun-Born, Cook, Michelle, Kim, Woo-Kyu, Klauck-Jacobs, Axel, Kudo, Takanori, Rahman, M. Dalil, Dammel, Ralph R, Byers, Jeffrey D.

Journal:

Journal of Photopolymer Science and Technology

Year:

2000

Language:

english

File:

PDF, 493 KB

english, 2000

4

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Lithographic performance of a dry-etch stable methacrylate resist at 193 nm

Dammel, Ralph R., Ficner, Stanley A., Oberlander, Joseph E., Klauck-Jacobs, Axel, Padmanaban, Munirathna, Khanna, Dinesh N., Durham, Dana L.

Year:

1998

Language:

english

File:

PDF, 2.78 MB

english, 1998

5

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Cycloolefin/maleic anhydride copolymers for 193-nm resist compositions

Rahman, M. D., Dammel, Ralph R., Cook, Michelle M., Ficner, Stanley A., Padmanaban, Munirathna, Oberlander, Joseph E., Durham, Dana L., Klauck-Jacobs, Axel, Conley, Will

Year:

1999

Language:

english

File:

PDF, 585 KB

english, 1999

6

Association studies of the HOPA dodecamer duplication variant in different subtypes of autism

Kim S. Beyer, Sabine M. Klauck, Axel Benner, Fritz Poustka, Annemarie Poustka

Journal:

American Journal of Medical Genetics Part A

Year:

2002

Language:

english

File:

PDF, 107 KB

english, 2002

7

(Pentafluoro-λ6-sulfanyl)cyclopentadiene and Cyclopentadienylidenetetrafluoro-λ6-sulfane

Dipl.-Chem. Axel Klauck, Prof. Dr. Konrad Seppelt

Journal:

Angewandte Chemie International Edition

Year:

1994

Language:

english

File:

PDF, 383 KB

english, 1994

8

(Pentafluor-λ6-sulfanyl)cyclopentadien und Cyclopentadienylidentetrafluor-λ6-sulfan

Axel Klauck, Prof. Dr. Konrad Seppelt

Journal:

Angewandte Chemie

Year:

1994

Language:

german

File:

PDF, 397 KB

german, 1994

9

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Investigation of a fluorinated ESCAP-based resist for 157-nm lithography

Cho, Sungseo, Klauck-Jacobs, Axel, Yamada, Shintaro, Xu, Cheng-Bai, Leonard, JoAnne, Zampini, Anthony, Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 399 KB

english, 2002

10

SPIE Proceedings [SPIE Microelectronic Manufacturing Technologies - Edinburgh, United Kingdom (Wednesday 19 May 1999)] Lithography for Semiconductor Manufacturing - Performance of 193-nm resists based on alicyclic methacrylate and cyclo-olefin systems

Padmanaban, Munirathna, Cook, Michelle M., Durham, Dana L., Khanna, Dinesh N., Klauck-Jacobs, Axel, Oberlander, Joseph E., Rahman, M. D., Dammel, Ralph R., Mack, Chris A., Stevenson, Tom

Year:

1999

Language:

english

File:

PDF, 2.79 MB

english, 1999

11

Synthesis and characterization of 1,2-bis (chlorosulfonyl) tetrafluoroethane and 1,2-bis (fluorosulfonyl) tetrafluoroethane

Darryl D. DesMarteau, Axel Klauck, Howard L. Hunter, Liang Zhang

Journal:

Journal of Fluorine Chemistry

Year:

1998

Language:

english

File:

PDF, 276 KB

english, 1998

12

Pentafluoro-λ6-sulfanylacetylene complexes of cobalt

Thomas Henkel, Axel Klauck, Konrad Seppelt

Journal:

Journal of Organometallic Chemistry

Year:

1995

Language:

english

File:

PDF, 596 KB

english, 1995

13

Haplotype analysis of the COMT-ARVCF gene region in Israeli anorexia nervosa family trios

Elena Michaelovsky, Amos Frisch, Shani Leor, Daniel Stein, Yardena Danziger, Cynthia Carel, Silvana Fennig, Marc Mimouni, Sabine M. Klauck, Axel Benner, Annemarie Poustka, Alan Apter, Abraham Weizman

Journal:

American Journal of Medical Genetics Part B: Neuropsychiatric Genetics

Year:

2005

Language:

english

File:

PDF, 79 KB

english, 2005

14

Carbon Sulfur Double Bonds

Henkel, Thomas, Klauck, Axel, Seppelt, Konrad

Journal:

Phosphorus Sulfur and Silicon and the Related Elements

Year:

1994

Language:

english

File:

PDF, 116 KB

english, 1994

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